New in 2025.1
Create/Edit
The ability to section off patterns to add in different fabrics or textures without cutting the pattern.
Create/Edit
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Within the 2D toolbar under Internal polygon tool, click
Seamless Blocking tool.
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Single Click on a pattern outline to start the creation process of a seamless blocking line or seamless line.
- Create or Edit the Seamless Blocking line referring to below table.
| Tool | Action | Outcome |
|---|---|---|
|
Seamless Blocking |
Clicking once on a pattern outline |
This will start the creation process of a seamless blocking line or seamless line. You can create any type of shape with as many points as you would like, through single clicks within a pattern piece. The Symmetry rules will be followed when creating the lines. With half symmetry when creating a line that goes over the half symmetrical line then it will not be replicated on the other side. Close shapes are the only creation that can be made using this tool. |
| Double Clicking on a pattern outline | This will end the shape / creation process. As long as you finish on a pattern outline or another seamless block line | |
| Holding down Ctrl | While creating a line if you hold down Ctrl curve points will be created | |
| Holding down Shift | While creating a seamless line if you hold down Shift this will give you 45 Degree angles for guidance | |
| Selecting Backspace/ Delete | While creating the lines if you select the back space this will delete the last created point | |
|
Edit Pattern |
Selecting Seamless Blocked Line/ Point (Single Left Click) |
Once the lines are created you can use the Edit pattern curve to edit the line or point. Click and dragging will move the line or point While dragging if you simultaneously right click a precision box will come up and you can edit the line using exact measurements Selecting the line using the edit pattern tool you can also delete the line or point as well. |
| Right Click on Pattern Outline or Seamless Line |
You can create more seamless blocked lines with the offset as seamless block line. From there you will be able to choose how many offset you would want to create, along with the distance that they should all be. Since closed shapes must always be created, the extend option will always be selected. |
|
| Editing Pattern line or Point | when adjusting the pattern outline or point the seamless blocked lines will follow along with the pattern outline adjustments | |
|
Transform Pattern |
Dragging Point or Line | The seamless block lines will follow the adjustments that are made to the whole pattern. It will follow based on proportion. |
|
Trace |
Right Click on a Internal or Base line. | There will be an option to convert to seamless block line. If the line/shape does not create a closed shape then CLO will not convert the internal line or base line into a seamless line. |
Set Fabric
Fabric can be added to different seamless blocked sections through dragging and dropping the fabric from the object browser onto the seamless block area in either the 3D or 2D window.
📝Note: The assigning option within the object browser will not work when seamless blocking is applied
Symmetry will not be followed when applying fabric with seamless blocking to allow for more creative options.
Using Transform Pattern tool , you will be able to select the seamless block section by double clicking. From there you will be able to see the fabric within use, within your property editor under the fabric section
Properties that will apply to the entire pattern:
- Information
- Bond/Skive
- Geometry
- Arrangement
📝Note:
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Graphic
The seamless blocking lines will not interfere with any placement of the graphics, it will be applied as if there aren't any lines.
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Topstitch & Puckering
These can be applied to seamless blocked lines as if they are internal lines using the Topstitch or Puckering tools to apply and edit onto the lines.
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Print Layout
If seamless blocking is applied to the patterns it will be excluded from the print layout window.
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Compatibility with Older Versions
If opening up a seamless block file within a CLO version below 2025.1 the seamless blocked lines will reflect as baselines.
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