New features and improvements for CLO ver3.2.0 are as follows.
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New Features
- Flattening
- IK
- Segment Darts
- Offset as Internal Line along Slope
- Rotation Angle Input (Pattern/ Graphic)
Improvements
- File Sharing
- Save User Setting as Configuration File
- Improvements to 2D Snapshot (2D Snapshot/ Print Layout 2D Snapshot)
- Automatic Resolution for 3D Snapshot (3D Snapshot/ Render)
- Simulation Presets as Tools
- Invert Selection
- Create Multiple Patterns or Internal Shapes and Input Intervals
- Convert Multiple Segment Points to Curve Points
- Create Ellipse with Circumference (Ellipse/ Internal Ellipse)
- Improvements to Add Point/Split Line
- Fixed Grid Display
- Toggle Option to Offset 2D Patterns with Cut
- Color Name Input
- Apply Topstitches and Puckering by Dragging (Topstitches/ Puckering)
- Set Sewing Fold Angles Between the Zipper and Pattern
- Duplicate as Button/Buttonhole to Symmetric Pattern
- Morph Target with AVT Files
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