There are three available modes in the upper right dropdown menu of the CLO window: Simulation, Print Layout, and Emulator.
In Simulation mode, it is possible to create and edit patterns in the 2D window, and in the 3D window drape garments, edit poses, or perform various other actions.
In Print Layout mode, you can manually place patterns on prints to match texture placements, calculate fabric consumption, and create printable pattern layouts.
In Emulator mode, you can enter the values of fabrics created with the CLO Fabric Kit (the precursor of the new CLO zFab Kit.)
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